sputtering equipment

基本解釋

• 濺鍍設(shè)備

英漢例句

雙語例句

• This paper presented a RF cylindrical magnetron sputtering equipment developed in our institute and the technique for sputtering films.
  本文介紹了我所研制的RF同軸磁控濺射裝置及成膜技術(shù)。
• Comparing with general sputtering method, this equipment has the advantages of decreasing the sputtering voltage and increasing the rate of deposition obviously.
  與普通濺射方法相比，本設(shè)備的優(yōu)點(diǎn)是：濺射電壓大大降低，而淀積速率提高很多。
• A new magnetron sputtering equipment for coating microparticles was designed and fabricated according to the characteristic of the magnetron sputtering method and powder particles.
  本論文根據(jù)磁控濺射及粉體顆粒的特點(diǎn)，設(shè)計并研制了一套微顆粒磁控濺射鍍膜設(shè)備；

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詞組短語

短語

• planar magnetron sputtering equipment 平面磁控濺射裝置
• sputtering equipment was used 濺射儀
• plasma sputtering equipment 等離子濺射設(shè)備
• cathode sputtering equipment 陰極濺射設(shè)備
• asymmetric AC sputtering equipment 非對稱交流濺射設(shè)備

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專業(yè)釋義

電子、通信與自動控制技術(shù)

• 濺鍍設(shè)備